Sematech Establishes EUV Resist Test Center at Albany Nanotech

Published September 2003

ALBANY, N.Y. -

SUNY Albany is working with International Sematech to create an extreme ultraviolet (EUV) Resist Test Center at Albany Nanotech. Slated for completion in April 2004, the center will be housed in the NanoFab II facility which is currently under construction. The center’s nine employees will test a photosensitive chemical called resist that can transfer a circuit pattern onto a semiconductor wafer. Sematech’s $403 million computer chip research center is also located at Albany Nanotech.

 

 

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